Propriedades Psicométricas da Escala de Presença em Tecnologias Ubíquas

Palavras-chave: autopresença, presença espacial, presença social, tecnologias ubíquas, avaliação psicológica.

Resumo

Este estudo teve como objetivo o desenvolvimento de uma escala de presença nas tecnologias ubíquas. O processo de desenvolvimento do instrumento teve como etapas a escolha dos atributos comportamentais referentes ao objeto de estudo e à operacionalização do construto, a apresentação a três juízes, dois grupos focais e a uma aplicação piloto em uma amostra reduzida (n = 30) e por fim, uma aplicação com a 458 participantes. Foram realizadas análises de consistência interna, análise fatorial confirmatória e análise fatorial confirmatória multigrupo. A versão final da Escala de Presença em Tecnologias Ubíquas conta com 14 itens, agrupados em três fatores independentes (Autopresença, Presença Espacial e Presença Social), e apresenta um bom índice de consistência interna (alfa = 0,905) e um índice de ajuste aceitável (c2  = 116,83; gl = 74; p < 0,01; CFI = 0,99; RMSEA = 0,035; SRMR = 0,053), com parâmetros psicométricos equivalentes por gênero.

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Biografia do Autor

Fabiane Schutz, Universidade Federal do Rio Grande do Sul (UFRGS), Porto Alegre, RS.

Doutora em Psicologia pela Universidade Federal do Rio Grande do Sul UFRGS, Porto Alegre, RS.

Lívia Maria Bedin, Universidade Federal do Rio Grande do Sul (UFRGS), Porto Alegre, RS.

Doutora em Psicologia pela Universidade Federal do Rio Grande do Sul (UFRGS, Porto Alegre, RS, Brasil). Professora do Departamento de Psicologia do Desenvolvimento e da Personalidade e do Programa de Pós-Graduação em Psicologia de Psicologia da Universidade Federal do Rio Grande do Sul (UFRGS) em Porto Alegre, RS.

Jorge Castellá Sarriera, Universidade Federal do Rio Grande do Sul (UFRGS), Porto Alegre, RS.

Doutor em Psicologia pela Universidade Autonoma de Madrid (UAM, Madri, Espanha). Professor do Departamento de Psicologia do Desenvolvimento e da Personalidade e do Programa de Pós-Graduação em Psicologia e do Programa de Pós-Graduação Política Social e Serviço Social da Universidade Federal do Rio Grande do Sul (UFRGS) em Porto Alegre, RS.

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Publicado
2020-02-12
Como Citar
Schutz, F., Bedin, L. M., & Sarriera, J. C. (2020). Propriedades Psicométricas da Escala de Presença em Tecnologias Ubíquas. Psico, 51(2), e31628. https://doi.org/10.15448/1980-8623.2020.2.31628
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Artigos